TEM Images of Interconnect Trench Fill using DC-TRIODE Sputtering of Aluminum
(Click on images for a full size view)
 
TEM images of interconnect trenchfill experiments using a DC-TRIODE sputtering system depositing aluminum. The DC-TRIODE does an excellent job of collimationg the sputtered flux.
 

SEM Images of Interconnect Trench Filling by Sputtering
(Click on images for a full size view)
These are images of various attempts to fill integrated circuit interconnect trenches by sputtering with a magnetron and a DC-TRIODE . The first two images are of a trench with a thin tantalum layer. The third image is of a magnettron trench fill attempt. The other images show various experiments performed with the DC-TRIODE system.

SEM Images of Sputtered Thin Film Interconnect Structures
(Click on images for a full size view)
Al thin film deposited on to silicon wafer interconnect trenches. Surface of Al thin film after resputtering. Surface of Al thin film after further resputtering. Al thin film surface after further resputtering Surface of Si wafer with interconnect trenches after sputtering.
 
TEM Images of Carbon Nanotubes
(Click on images for a full size view)

Carbon nanotubes grown at the
Naval Research Laboratory in Washington D.C.

Diffraction pattern of a carbon nanotube.
 
TEM Images of Conical Structures on Sputtered AgCu Alloys
 (Click on images for a full size view)
During sputtering various types of structures develop on metal alloy surfaces. These images show that the larger cones are made up of both Ag and Cu while the smaller structures are made up of only one element and are probably nanodendrites.
 
TEM Calibration Images
(Click on images for a full size view)
Diffraction grating calibration image. Latex sphere calibration image. Si lattice calibration image. Asbestos lattice calibration image. Diffraction pattern of gold on Holey Carbon Film.
 
TEM of AgCu Alloy Grain Structure and Orientation
(Click on images for a full size view)
 
Alloys fabricated by melting powders inside of a vacuum chamber.  
 
TEM of Attempted Epitaxial Growth of Si
(Click on images for a full size view)
 
TEM images of the results of an attempt to deposit epitaxial Si using ion beam assited deposition.
 
TEM images of a Cross-sectioned Integrated Circuit
(Click on images for a full size view)
TEM images of a tripod polished integrated circuit cross-section.
Interesting TEM Images
(Click on images for a full size view)
Carbon nanotubes grown during TEM observation. Convergent beam electron diffraction image of GMR spin valve. AgCu nanofiliment. Cross section of an E-Beam grown cone during SEM imaging. Diffraction pattern of an E-Beam grown cone.